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ACM Tech Patents
Assignee:
ACM Tech
Address:
Seoul, KR
No. of patents:
2
Patents:




Patent Number Title Of Patent Date Issued
6843930 Composition of refrigerant mixtures for high back pressure condition January 18, 2005
There is provided a composition of refrigerant mixtures for high back pressure condition, comprising propane, propylene or 1,1-difluoroethane and, optionally, additive selected from the group consisting of carbon dioxide, trifluoromethyl iodide and mixture thereof. The composition ac
6649079 Composition of refrigerant mixtures for low back pressure condition November 18, 2003
There is provided a composition of refrigerant mixtures for low back pressure condition, comprising isobutane, 1,1-difluoroethane and, optionally, additive selected from the group consisting of carbon oxide, trifluoromethyl iodide and mixture thereof. The composition according to the

 
 
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