Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     AAdvanced Micro Devices, Inc. Patents Assignee: AAdvanced Micro Devices, Inc. Address: Sunnyvale, CA No. of patents: 1 Patents: Patent Number Title Of Patent Date Issued 6475892 Simplified method of patterning polysilicon gate in a semiconductor device November 5, 2002 Polysilicon gates are formed with greater accuracy and consistency by depositing a silicon carbide antireflective layer on the polysilicon layer before patterning. Embodiments also include depositing the polysilicon layer and the silicon carbide layer in the same tool.       Recently Added Patents Method and apparatus to maintain data integrity in disk cache memory during and after periods of cache inaccessibility Mobile communication terminal which selects one of a plurality of base stations corresponding to respective different communication standards to communicate with, based on estimated data throu System and method for designing a network Displacement field calculation Portion of a remote controller Secondary package Lighting fixture   Randomly Featured Patents Ultraviolet and infrared absorptive greenish glass Method of increasing the size and/or absorption under load of superabsorbent polymers by surface cross-linking and subsequent agglomeration of undersized particcles Pressure-sensitive adhesives Check valve for intraluminal graft Record rack Method of making coating surrounding a piezoelectric solid state motor stack Network multiplex structure Electrical compressor for motor vehicle horns, comprising an electric motor and air compressor in mutual axial alignment relationship System and method for controlling a display of graphics data pixels on a video monitor having a different display aspect ratio than the pixel aspect ratio Semiconductor light emitting devices including patternable films comprising transparent silicone and phosphor © 2006. PatentGenius. All Rights Reserved.